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SiLM quantum efficiency

Image sensor quantum efficiency depends on several design and construction factors.  The SiLM technology was designed to optimize all of these.

 

Effective anti-reflectance coating

Silicon has a high index of refraction so it looks like a mirror to the eye.  In practice, uncoated silicon reflects around 40% of the incoming light.  This can be reduced to less than 1% by the application of an anti-reflectance coating but almost all CCD and CMOS imagers have a thick SiO layer on top that makes AR coatings ineffective. 

 

The SiLM photodiodes, however, are covered by only 50nm of passivation/protection materials and nothing else, permitting deposition of highly effective AR coatings.

 

SiLM Quantum Efficiency

Very high fill factor

The construction of most sensors requires that much of the input surface be used for scan circuitry and electrical conductors.  In small-pixel sensors, the insensitive area can exceed 60%. Microlenses can help but these introduce directional effects that complicate selection of optics.  

 

In SiLM sensors, the fill factor is always essentially 100%.  Nothing is located on the illuminated surface except photodiodes.  This means that every incoming photon enters a sensitive area.

 

 

The SiLM reflector

Some of the photons entering a sensor pass right through the photodiodes without being converted to charge.   The longer the wavelength, the less absorption occurs.  In both CCDs and CMOS sensors, the typical absorption thickness is only a few  microns.  As a result, much of the red and most of the near infrared photons are not captured.

 

Since the SiLM sense wafer is constructed of two fused layers, a mirror can be fabricated between the layers before they are fused.  This mirror reflects the photons that would normally pass through the silicon back through for a second chance to be absorbed.  Better NIR response is the result.  The graph below shows the effect of adding the reflector to the already high QE of the SiLM sensor.

 

SiLM-R is a process in which a dichroic mirror is fabricated below the photodiodes to reflect the light back through the silicon. 

 

The reflectance band can be tuned for each application.  The curve shown uses a filter designed for flat response in the visible range providing the equivalent if 12 µm of silicon thickness.  Tuning for longer wavelengths can double the NIR response from 900 nm out.

 


For a full description of the
SiLM technology, please download the pdf presentation here.

SiLM Structure | SiLM Sensor Products | SiLM Demonstation Sensor | Lumiense Main Page

 

 

 
 

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